ASML Ships Groundbreaking “High NA” EUV Lithography Systems to Intel
On Thursday, ASML, a prominent Dutch semiconductor equipment manufacturer, announced the commencement of shipments for its revolutionary “High NA” extreme ultraviolet (EUV) lithography systems to Intel. Priced at over $300 million each, these cutting-edge machines are set to empower chip manufacturers in creating smaller and faster semiconductors.
ASML shared an image on the X social media platform, capturing a segment of the machine departing from its headquarters in Veldhoven, Netherlands. The photo showcased the machinery encased protectively with a red ribbon adorning it. The accompanying statement expressed excitement and pride in delivering the inaugural High NA EUV system to Intel.
Advanced Lithography Technology
As a dominant force in the lithography systems market, ASML’s machines deploy lasers to facilitate the creation of chip circuitry. The High NA machines, expected to be larger than a truck when fully assembled, are being transported in 250 separate crates, including 13 sizable containers. Commercial chip manufacturing utilizing these machines is anticipated to commence in 2026 or 2027.
Intel placed the initial order for the High NA pilot machines in 2022. Notably, other major players in the chip manufacturing industry, such as TSMC (2330.TW), Samsung (005930.KS), SK Hynix (000660.KS), and Micron (MU.O), have also secured orders for these state-of-the-art machines.
During a briefing on November 30, ASML informed reporters of its expectation to ship the first pilot tools before the close of the year. The High NA EUV lithography systems represent a significant leap forward in semiconductor manufacturing, promising enhanced capabilities for the production of future-generation chips.
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